Detailed explanation of picture and photo requirements in U.S. design patent applications
Detailed explanation of picture and photo requirements in U.S. design patent applications U.S. design patent applications are significantly different from those in China, especially in the review system and document requirements. In the United States, design patents are subject to substantive examination, and the examiner needs to search for comparative documents of relevant categories to assess the novelty and non-obviousness of the design. Design patent applications are mainly presented through pictures or photos. Therefore, these visual materials are crucial to the authorization of the patent and the scope of rights…